Plasma device and plasma generating method
US7243610B2 · kind B2 · utility
224Cited by
10References
20Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jan 18, 2002 |
| Grant date | Jul 17, 2007 |
| Priority date | — |
| Expiry date | May 10, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma device includes a slot antenna (30) for supplying a high frequency electromagnetic field (F) supplied through a feeding part into a processing vessel (11). The feeding part has a cavity (35) for forming a resonator and converting the fed high frequency electromagnetic field (F) into a rotating electromagnetic field and supplying the rotating electromagnetic field to the slot antenna (30).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.