Use of supercritical fluid to dry wafer and clean lens in immersion lithography
US7262422B2 · kind B2 · utility
36Cited by
3References
20Claims
0Family size
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Key dates
| Filing date | Jul 1, 2005 |
| Grant date | Aug 28, 2007 |
| Priority date | — |
| Expiry date | Apr 17, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70925
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed are immersion lithography methods and systems involving irradiating a photoresist through a lens and an immersion liquid of an immersion lithography tool, the immersion liquid in an immersion space contacting the lens and the photoresist; removing the immersion liquid from the immersion space; charging the immersion space with a supercritical fluid; removing the supercritical fluid from the immersion space; and charging the immersion space with immersion liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.