Sensor for use in a lithographic apparatus
US7282701B2 · kind B2 · utility
5Cited by
3References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 28, 2005 |
| Grant date | Oct 16, 2007 |
| Priority date | — |
| Expiry date | May 15, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.