Methods for cleaning a substrate
US7288156B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 10, 2006 |
| Grant date | Oct 30, 2007 |
| Priority date | — |
| Expiry date | Jan 10, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The invention provides a water supplying apparatus and method thereof which has a high capacity of peeling and removing a disused material such as a resist film and the like, and can efficiently use water vapor. A water supplying apparatus for executing a washing process, a cleaning process and a working process of a subject, is provided with a water vapor body supplying means for supplying a water vapor body, and a water mist body supplying means for supplying a water mist body containing liquid water fine particles, and the structure is made such that said water vapor body and said water mist body are supplied to the subject by independently controlling said two means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.