Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor
US7300537B2 · kind B2 · utility
46Cited by
23References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 2, 2004 |
| Grant date | Nov 27, 2007 |
| Priority date | — |
| Expiry date | Jan 4, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3255
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Components of semiconductor processing apparatus comprise thermal sprayed yttria-containing coatings that provide erosion, corrosion and/or corrosion-erosion resistance in plasma atmospheres. The coatings can protect substrates from physical and/or chemical attack.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.