Method and apparatus for reducing biological contamination in an immersion lithography system
US7315033B1 · kind B1 · utility
38Cited by
3References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 4, 2005 |
| Grant date | Jan 1, 2008 |
| Priority date | — |
| Expiry date | Mar 16, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70925
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed are a method of reducing biological contamination in an immersion lithography system and an immersion lithography system configured to reduce biological contamination. A reflecting element and/or an irradiating element is used to direct radiation to kill biological contaminates present with respect to at least one of i) a volume adjacent a final element of the projection system or ii) an immersion medium supply device disposed adjacent the final element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.