Patent · US Active

Technique for CD measurement on the basis of area fraction determination

US7335880B2 · kind B2 · utility

4Cited by

3References

11Claims

0Family size

Assignee

Advanced Micro Devices, Inc. · US

Inventors

Eckhard Langer · Radebeul, DE
Moritz Andreas Meyer · Pulheim, DE

Key dates

Filing date	Nov 17, 2005
Grant date	Feb 26, 2008
Priority date	—
Expiry date	Sep 29, 2026

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/2817
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

The present invention provides a technique for estimating critical dimensions of highly scaled circuit features on the basis of scanning electron microscopy, wherein area fractions of a scan area are determined. Preferably, the SEM is operated with high electron beam energies to enhance the overall resolution and to reduce edge effects and image artifacts. Thus, fast and statistically significant measurement results may be obtained, thereby allowing enhanced process control.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.