Patent · US Active

Methods of forming patterned reticles

US7350182B2 · kind B2 · utility

1Cited by

9References

14Claims

0Family size

Assignee

Micron Technology, Inc. · US

Inventors

H. Daniel Dulman · Boise, US
William A. Stanton · Boise, US
John R. C. Futrell · Boise, US

Key dates

Filing date	Aug 4, 2004
Grant date	Mar 25, 2008
Priority date	—
Expiry date	Jul 30, 2026

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/36
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.