Patent · US Active

Bottom conductor for integrated MRAM

US7358100B2 · kind B2 · utility

5Cited by
10References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 14, 2007
Grant dateApr 15, 2008
Priority date
Expiry dateAug 14, 2027

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10B61/22

Abstract

A method to fabricate an MTJ device and its connections to a CMOS integrated circuit is described. The device is built out of three layers. The bottom layer serves as a seed layer for the center layer, which is alpha tantalum, while the third, topmost, layer is selected for its smoothness, its compatibility with the inter-layer dielectric materials, and its ability to protect the underlying tantalum.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.