Methods and systems for reticle inspection and defect review using aerial imaging
US7379175B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 6, 2003 |
| Grant date | May 27, 2008 |
| Priority date | — |
| Expiry date | Jan 27, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/95676
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and systems for inspecting a reticle are provided. In an embodiment, a system may include an inspection subsystem configured to form a first aerial image of the reticle. The first aerial image may be used to detect defects on the reticle. The system may also include a review subsystem coupled to the inspection subsystem. For example, the inspection and review subsystems may have common optics, separate optics and a common stage, or separate stages and a common handler. The review subsystem may be configured to form a second aerial image of the reticle. The second aerial image may be used to analyze the defects. In another embodiment, the system may include an image computer configured to receive image data from the inspection and review subsystems representing the first and second aerial images. The image computer may also be configured to perform one or more functions on the image data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.