Lithographic projection apparatus
US7388648B2 · kind B2 · utility
Assignee
Inventors
- Joeri Lof
- Antonius Theodorus Anna Maria Derksen
- Christiaan Alexander Hoogendam
- Aleksey Yurievich Kolesnychenko
- Erik Roelof Loopstra
- Theodorus Marinus Modderman
- Johannes Catharinus Hubertus Mulkens
- Roelof Aeilko Siebrand Ritsema
- Klaus Simon
- Joannes Theodoor De Smit
- Alexander Straaijer
- Bob Streefkerk
- Helmar Van Santen
Key dates
| Filing date | Sep 30, 2005 |
| Grant date | Jun 17, 2008 |
| Priority date | — |
| Expiry date | Dec 28, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table. The liquid confinement structure is positioned adjacent a final surface of the projection system and includes a first inlet configured to supply a liquid, through which a patterned beam is to be projected, to the space, and a second inlet configured to supply gas and formed in a face of the structure. The face is arranged to oppose a surface of the substrate and the second inlet is located radially outward, with respect to an optical axis of the projection system, of the space and has a porous member to evenly distribute gas flow over an area of the second inlet.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.