Optical metrology optimization for repetitive structures
US7388677B2 · kind B2 · utility
16Cited by
17References
29Claims
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Key dates
| Filing date | Feb 18, 2005 |
| Grant date | Jun 17, 2008 |
| Priority date | — |
| Expiry date | Aug 23, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70625
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The top-view profiles of repeating structures in a wafer are characterized and parameters to represent variations in the top-view profile of the repeating structures are selected. An optical metrology model is developed that includes the selected top-view profile parameters of the repeating structures. The optimized optical metrology model is used to generate simulated diffraction signals that are compared to measured diffraction signals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.