Patent · US Expired

Fabrication system and fabrication method

US7392106B2 · kind B2 · utility

4Cited by
30References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 30, 2005
Grant dateJun 24, 2008
Priority date
Expiry dateDec 30, 2025

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S438/908
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A fabricating method for a system that includes a plurality of processing apparatuses connected to each other by an inter-apparatus transporter and a computer storing managing information of processing and transporting of semiconductor wafers. The processing apparatuses have an interface for loading and unloading a plurality of the semiconductor wafers that are contained in a carrier. The semiconductor waters are processed in processing chambers of the processing apparatuses and the result of processing is monitored. In the processing, a first carrier containing the plurality of the semiconductor wafers having been processed in the first processing apparatus is transported toward the second processing apparatus by the inter-apparatus transporter prior to unloading of a second carrier containing semiconductor wafers processed in the second processing apparatus, according to the managing information.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.