Mario Hennig
7Patents
3h-index
18Co-inventors
46Inventor score
Filing activity: Dec 2, 2002 → Jan 30, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7425396B2 | Method for reducing an overlay error and measurement mark for carrying out the same | Emerging Cross-Sectional Technologies | 8 | Active |
| US7339652B2 | Apparatus for projecting a pattern into an image plane | Physics | 6 | Active |
| US7644389B2 | Method for producing a mask for the lithographic projection of a pattern onto a substrate | Physics | 4 | Active |
| US6838216B2 | Photolithographic mask and methods for producing a structure and of exposing a wafer in a projection apparatus | Physics | 3 | Expired |
| US7045254B2 | Mask with programmed defects and method for the fabrication thereof | Physics | 3 | Expired |
| US7393613B2 | Set of at least two masks for the projection of structure patterns | Physics | 2 | Expired |
| US7393614B2 | Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer | Physics | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.