Selecting a hypothetical profile to use in optical metrology
US7394554B2 · kind B2 · utility
4Cited by
7References
32Claims
0Family size
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Key dates
| Filing date | Sep 15, 2003 |
| Grant date | Jul 1, 2008 |
| Priority date | — |
| Expiry date | Feb 6, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70625
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A hypothetical profile is used to model the profile of a structure formed on a semiconductor wafer to use in determining the profile of the structure using optical metrology.To select a hypothetical profile, sample diffraction signals are obtained from measured diffraction signals of structures formed on the wafer, where the sample diffraction signals are a representative sampling of the measured diffraction signals. A hypothetical profile is defined and evaluated using a sample diffraction signal from the obtained sample diffraction signals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.