Patent · US Active

Objectives as a microlithography projection objective with at least one liquid lens

US7428105B2 · kind B2 · utility

8Cited by

11References

26Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

David Shafer · Fairfield, US
Susanne Beder · Aalen, DE
Karl-Heinz Schuster · Oberkochen, DE
Wolfgang Singer · Aalen, DE

Key dates

Filing date	Jun 5, 2007
Grant date	Sep 23, 2008
Priority date	—
Expiry date	Jun 5, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70966
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index nF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.