Integrated in situ scanning electronic microscope review station in semiconductor wafers and photomasks optical inspection system
US7428850B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 22, 2006 |
| Grant date | Sep 30, 2008 |
| Priority date | — |
| Expiry date | Aug 30, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate inspection system includes two or more inspection modules supported on a plate. A chamber is supported beneath the plate by a translation system, which is configured to provide horizontal displacement of the chamber under the plate to permit loading and unloading of a substrate to/from the chamber. Thus, when the chamber is in a loading/unloading position it is at least partially uncovered from the plate. The translation system may be further configured to provide vertical displacement of the chamber with respect to the plate so as to position an upper surface of a wall of the chamber in close proximity to a lower surface of the plate when the chamber is in an inspection position. In such a position, the upper surface of the wall of the chamber and the lower surface of the plate may be separated by an air gap.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.