System and method for producing bubble free liquids for nanometer scale semiconductor processing
US7452408B2 · kind B2 · utility
0Cited by
6References
23Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 30, 2005 |
| Grant date | Nov 18, 2008 |
| Priority date | — |
| Expiry date | Apr 4, 2027 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D19/0042
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A system for producing bubble free liquid includes a continuous liquid source and a de-bubbling chamber. The de-bubbling chamber includes an outlet and an inlet. The inlet coupled to an outlet of the continuous liquid source by a supply pipe. The de-bubbling chamber also includes at least one port in a sidewall of the de-bubbling chamber. The at least one port being at least a length L from the inlet of the de-bubbling chamber. A method for producing bubble free liquid is also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.