Jeffrey Farber
15Patents
5h-index
17Co-inventors
59Inventor score
Filing activity: Jun 25, 1999 → Sep 18, 2013
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6187684A | Methods for cleaning substrate surfaces after etch operations | Electricity | 39 | Expired |
| US6405399B1 | Method and system of cleaning a wafer after chemical mechanical polishing or plasma processing | Emerging Cross-Sectional Technologies | 12 | Expired |
| US7735177B1 | Brush core assembly | Electricity | 10 | Active |
| US7811424B1 | Reducing mechanical resonance and improved distribution of fluids in small volume processing of semiconductor materials | Chemistry; Metallurgy | 7 | Active |
| US6645052B2 | Method and apparatus for controlling CMP pad surface finish | Performing Operations; Transporting | 6 | Expired |
| US6939207B2 | Method and apparatus for controlling CMP pad surface finish | Performing Operations; Transporting | 4 | Expired |
| US8043441B2 | Method and apparatus for cleaning a substrate using non-Newtonian fluids | Emerging Cross-Sectional Technologies | 4 | Active |
| US8671959B2 | Method and apparatus for cleaning a substrate using non-newtonian fluids | Emerging Cross-Sectional Technologies | 4 | Active |
| US7913703B1 | Method and apparatus for uniformly applying a multi-phase cleaning solution to a substrate | Emerging Cross-Sectional Technologies | 3 | Active |
| US7614411B2 | Controls of ambient environment during wafer drying using proximity head | Emerging Cross-Sectional Technologies | 2 | Expired |
| US8726919B2 | Method and system for uniformly applying a multi-phase cleaning solution to a substrate | Emerging Cross-Sectional Technologies | 0 | Active |
| US7452408B2 | System and method for producing bubble free liquids for nanometer scale semiconductor processing | Performing Operations; Transporting | 0 | Active |
| US8535451B2 | Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids | Emerging Cross-Sectional Technologies | 0 | Active |
| US8567421B2 | Method and system for uniformly applying a multi-phase cleaning solution to a substrate | Emerging Cross-Sectional Technologies | 0 | Active |
| US7568490B2 | Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids | Emerging Cross-Sectional Technologies | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.