Patent · US Active

Sensor for use in a lithographic apparatus

US7453078B2 · kind B2 · utility

4Cited by

10References

3Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Haico Victor Kok · Eindhoven, NL
Marcus Adrianus Van De Kerhof · Helmond, NL
Borgert Kruizinga · Zoetermeer, NL
Timotheus Franciscus Sengers · 's-Hertogenbosch, NL
Bearrach Moest · Eindhoven, NL
Marc Antonius Maria Haast · Eindhoven, NL
Peter Weissbrodt · Arnhem, NL
Manfred Schrenk · Kahla, DE
Torsten Harzendorf · Jena, DE

Key dates

Filing date	Sep 7, 2007
Grant date	Nov 18, 2008
Priority date	—
Expiry date	Sep 7, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7085
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.