Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
US7462439B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 23, 2005 |
| Grant date | Dec 9, 2008 |
| Priority date | — |
| Expiry date | May 3, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/952
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed herein is a top anti-reflective coating polymer represented by Formula 1, below:wherein R1 and R2 are independently hydrogen, fluoro, methyl or fluoromethyl; R3 is a C1-10 hydrocarbon or a C1-10 hydrocarbon in which the hydrogen atoms are partly replaced by fluorine atoms; and a, b and c, representing the mole fraction of each monomer, are in the range between 0.05 and 0.9. Because a top anti-reflective coating formed using the anti-reflective coating polymer of Formula 1 is not soluble in water, it can be applied to immersion lithography using water as a medium for a light source. In addition, because the top anti-reflective coating can reduce the reflectance from an underlying layer, the uniformity of CD is improved, thus enabling the formation of an ultra fine pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.