Transforming metrology data from a semiconductor treatment system using multivariate analysis

US7467064B2 · kind B2 · utility

Assignee

• TIMBRE TECHNOLOGIES, INC. · US

Inventors

• Vi Vuong · Fremont, US
• Junwei Bao · Los Altos, US
• Yan Chen · Cupertino, US
• Weichert Heiko · Utzberg, DE
• Sebastien Egret · Lumbin, FR

Key dates

• Filing date: Feb 7, 2006
• Grant date: Dec 16, 2008
• Expiry date: Jun 15, 2027

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N2021/215
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

Metrology data from a semiconductor treatment system is transformed using multivariate analysis. In particular, a set of metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. One or more essential variables for the obtained set of metrology data is determined using multivariate analysis. A first metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. The first obtained metrology data is not one of the metrology data in the set of metrology data earlier obtained. The first metrology data is transformed into a second metrology data using the one or more of the determined essential variables.