EUV reticle handling system and method
US7477358B2 · kind B2 · utility
13Cited by
15References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 28, 2005 |
| Grant date | Jan 13, 2009 |
| Priority date | — |
| Expiry date | May 29, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70741
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. The enclosure in conjunction with a heater and heat sink provides thermophoretic protection of an enclosed reticle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.