Methods for selective placement of dislocation arrays
US7494881B2 · kind B2 · utility
1Cited by
19References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 26, 2007 |
| Grant date | Feb 24, 2009 |
| Priority date | — |
| Expiry date | Nov 26, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/938
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Misfit dislocations are selectively placed in layers formed over substrates. Thicknesses of layers may be used to define distances between misfit dislocations and surfaces of layers formed over substrates, as well as placement of misfit dislocations and dislocation arrays with respect to devices subsequently formed on the layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.