System for and method of investigating the exact same point on a sample substrate with multiple wavelengths
US7508510B2 · kind B2 · utility
1Cited by
7References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 12, 2006 |
| Grant date | Mar 24, 2009 |
| Priority date | — |
| Expiry date | Sep 13, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/213
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
System for and Method of analyzing a sample at substantially the exact same small spot thereon with a plurality of wavelengths using a lens system which provides the same focal length at at least two wavelengths at various positions thereof with respect to a sample, including analyzing data obtained at those wavelengths.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.