Lamp array for thermal processing exhibiting improved radial uniformity
US7509035B2 · kind B2 · utility
22Cited by
7References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 2, 2005 |
| Grant date | Mar 24, 2009 |
| Priority date | — |
| Expiry date | May 19, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B3/0047
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A thermal processing chamber includes a substrate support rotating about a center axis and a lamphead of plural lamps in an array having a predetermined difference in radiance pattern between them. The radiance pattern includes a variation in diffuseness or collimation. In one embodiment, the center lines of all of the lamps are disposed away from the center axis. The array can be an hexagonal array, in which the center axis is located at a predetermined position between neighboring lamps.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.