Semiconductor production system and semiconductor production process
US7510884B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 14, 2004 |
| Grant date | Mar 31, 2009 |
| Priority date | — |
| Expiry date | Jan 20, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01F25/10
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A semiconductor manufacturing apparatus according to the present invention comprises: a treating unit that treats a substrate to manufacture thereon a semiconductor device; a fluid supplying channel for supplying a fluid required for a treatment of the substrate to the treating unit; a set voltage outputting unit that outputs a set voltage corresponding to a set flow volume of the fluid; a massflow controller disposed on the fluid supplying channel, that controls a flow volume of the fluid based on the set voltage; a first shut-off valve disposed on the fluid supplying channel on an upstream side of the massflow controller; and a second shut-off valve disposed on the fluid supplying channel on a downstream side of the massflow controller. The massflow controller includes: a detecting unit that detects an actual flow volume of the fluid and outputs a corresponding detected voltage; a comparing unit that compares the set voltage with the detected voltage to output an operation signal; and a flow volume adjusting unit that adjusts the flow volume of the fluid based on the operation signal. A storing unit is provided, that stores the detected voltage outputted from the detecting unit o…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.