Raster frame beam system for electron beam lithography

US7521700B2 · kind B2 · utility

Assignee

• Applied Materials Israel Ltd. · IL

Inventors

• Meir Aloni · Herzliya, IL
• Mula Friedman · Givat Shmuel, IL
• Jimmy Vishnipolsky · Petah Tikva, IL
• Gilad Almogy · Givatayim, IL
• Alon Litman · Nes Ziona, IL
• Yonatan Lehman · Yavne, IL
• Doron Meshulach · Ramat Gan, IL
• Ehud Tirosh · Nes Ziona, IL

Key dates

• Filing date: Jul 17, 2006
• Grant date: Apr 21, 2009
• Expiry date: Jan 15, 2027

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/31776
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.