Lithographic apparatus and method for manufacturing a device
US7542127B2 · kind B2 · utility
Assignee
Inventors
- Timotheus Franciscus Sengers
- Nicolaas Antonius Allegondus Johannes Van Asten
- Wilhelmus Josephus Box
- Tjarko Adriaan Rudolf Van Empel
- Leon Martin Levasier
- Erik Roelof Loopstra
- Marcel Johannus Elisabeth Hubertus Muitjens
- Luberthus Ouwehand
- Leon Joseph Maria Van Den Schoor
- Marcel Beckers
- Rob Jansen
- Elke Van Loenhout
Key dates
| Filing date | Dec 21, 2005 |
| Grant date | Jun 2, 2009 |
| Priority date | — |
| Expiry date | May 17, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7034
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.