Shields usable with an inductively coupled plasma reactor
US7569125B2 · kind B2 · utility
12Cited by
22References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 5, 2005 |
| Grant date | Aug 4, 2009 |
| Priority date | — |
| Expiry date | Sep 6, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3327
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A one-piece inner shield usable in a plasma sputter reactor and extending from the target to the pedestal with a smooth inner surface and supported by an annular flange in a middle portion of the shield. The shield may be used to support the RF coil used in exciting the plasma. An outer shield includes an outwardly extending flange on its end alignable with the inner shield flange, holes in correspondence to recesses in the inner shield for standoffs for the RF coil, and circumferentially arranged gas flow holes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.