Microlithographic projection exposure apparatus

US7570343B2 · kind B2 · utility

Assignee

• Carl Ziess SMT AG · DE

Inventors

• Aurelian Dodoc · Heidenheim an der Brenz, DE
• Karl-Heinz Schuster · Oberkochen, DE
• Joerg Mallmann · Boppard, DE
• Wilhelm Ulrich · Aalen, DE
• Hans-Juergen Rostalski · Oberkochen, DE
• Hubert Holderer · Oberkochen, DE
• Bernhard Gellrich · Aalen, DE
• Juergen Fischer · Adelsheim, DE
• Susanne Beder · Aalen, DE
• Andreas Wurmbrand · Aalen, DE
• Ulrich Loering · Schwäbisch Gmünd, DE
• Albrecht Ranck · Aalen, DE

Key dates

• Filing date: Nov 23, 2005
• Grant date: Aug 4, 2009
• Expiry date: Nov 23, 2025

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70983
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.