Patent · US Active

Graded spin-on organic antireflective coating for photolithography

US7588879B2 · kind B2 · utility

7Cited by

20References

24Claims

0Family size

Assignee

International Business Machines Corporation · US

Inventors

Colin J. Brodsky · Salt Point, US
Sean D. Burns · Yorktown Heights, US
Dario L. Goldfarb · Potsdam, US
Michael Lercel · Williston, US
David R. Medeiros · Dobbs Ferry, US
Dirk Pfeiffer · Dobbs Ferry, US
Daniel P. Sanders · San Jose, US
Steven Scheer · Austin, US
Libor Vyklicky · Yorktown Heights, US

Key dates

Filing date	Mar 5, 2008
Grant date	Sep 15, 2009
Priority date	—
Expiry date	Mar 5, 2028

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S438/952
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.