LPP EUV plasma source material target delivery system
US7589337B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 12, 2008 |
| Grant date | Sep 15, 2009 |
| Priority date | — |
| Expiry date | Mar 12, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0027
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing optical element having a first range of operating center wavelengths; a droplet detection radiation source having a second range of operating center wavelengths; a drive laser steering element comprising a material that is highly reflective within at least some part of the first range of wavelengths and highly transmissive within at least some part of the second range of center wavelengths; a droplet detection radiation aiming mechanism directing the droplet detection radiation through the drive laser steering element and the lens to focus at a selected droplet detection position intermediate the droplet generator and the irradiation site.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.