Liquid cooled mirror for use in extreme ultraviolet lithography
US7591561B2 · kind B2 · utility
4Cited by
3References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 9, 2006 |
| Grant date | Sep 22, 2009 |
| Priority date | — |
| Expiry date | Nov 9, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/065
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods and apparatus for internally or directly cooling a mirror using a fluid with laminar flow properties are disclosed. According to one aspect of the present invention, an internally cooled mirror includes an optical surface that absorbs light, and at least one microchannel formed beneath the optical surface. The mirror also includes a port that supplied a fluid to the microchannel. The fluid is subjected to a laminar flow and absorbs heat associated with the absorbed light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.