Control system for a two chamber gas discharge laser
US7596164B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 15, 2006 |
| Grant date | Sep 29, 2009 |
| Priority date | — |
| Expiry date | Dec 29, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2333
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.