Patent · US Active

Laser produced plasma EUV light source

US7598509B2 · kind B2 · utility

27Cited by

148References

50Claims

0Family size

Assignee

Cymer, LLC · US

Inventors

Alexander I. Ershov · Escondido, US
William N. Partlo · Poway, US
Norbert Bowering · San Diego, US
Bjorn Hansson · Bromma, SE

Key dates

Filing date	Feb 21, 2006
Grant date	Oct 6, 2009
Priority date	—
Expiry date	May 12, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70033
WIPO fieldMedical technology
WIPO sectorInstruments

Abstract

An EUV light source is disclosed that may include a laser source, e.g. CO2 laser, a plasma chamber, and a beam delivery system for passing a laser beam from the laser source into the plasma chamber. Embodiments are disclosed which may include one or more of the following; a bypass line may be provided to establish fluid communication between the plasma chamber and the auxiliary chamber, a focusing optic, e.g. mirror, for focusing the laser beam to a focal spot in the plasma chamber, a steering optic for steering the laser beam focal spot in the plasma chamber, and an optical arrangement for adjusting focal power.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.