Patent · US Expired

Charged particle beam drawing apparatus

US7608844B2 · kind B2 · utility

1Cited by
8References
21Claims
0Family size

Assignees

Inventors

Key dates

Filing dateMay 25, 2005
Grant dateOct 27, 2009
Priority date
Expiry dateMay 25, 2025

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/31762
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

In the present invention, vector data developing unit, ends separating unit, overlap removing unit and bitmapped data generating unit are sequentially connected in order to make pipeline processing. In addition, data of each raster is orderly arranged as a unit so that each processor can process data of each raster at a time. Each processor can make the pipeline processing to fast generate data. In addition, small-scale circuits can be used to realize the system because each raster can be processed as a unit of processing. Moreover, since data is orderly arranged before being processed, multi-valued bitmapped data can be generated in the order of drawing. Therefore, the drawing operation and data generating operation can be performed in parallel without use of any large-scale storage device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.