Kyle Patterson
7Patents
2h-index
13Co-inventors
44Inventor score
Filing activity: May 6, 2003 → Jun 24, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7109101B1 | Capping layer for reducing amorphous carbon contamination of photoresist in semiconductor device manufacture; and process for making same | Electricity | 13 | Expired |
| US6972255B2 | Semiconductor device having an organic anti-reflective coating (ARC) and method therefor | Emerging Cross-Sectional Technologies | 5 | Expired |
| US7935547B2 | Method of patterning a layer using a pellicle | Physics | 1 | Active |
| US7615318B2 | Printing of design features using alternating PSM technology with double mask exposure strategy | Physics | 0 | Active |
| US8039389B2 | Semiconductor device having an organic anti-reflective coating (ARC) and method therefor | Emerging Cross-Sectional Technologies | 0 | Active |
| US11014622B1 | Retractable cover systems | Performing Operations; Transporting | 0 | Active |
| US7199429B2 | Semiconductor device having an organic anti-reflective coating (ARC) and method therefor | Emerging Cross-Sectional Technologies | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.