Uniformity control for low flow process and chamber to chamber matching
US7622005B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 16, 2005 |
| Grant date | Nov 24, 2009 |
| Priority date | — |
| Expiry date | Sep 29, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45574
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatus and methods for distributing gases into a processing chamber are disclosed. In one embodiment, the apparatus includes a gas distribution plate having a plurality of apertures disposed therethrough and a blocker plate having both a plurality of apertures disposed therethrough and a plurality of feed through passageways disposed therein. A first gas pathway delivers a first gas through the plurality of apertures in the blocker plate with sufficient pressure drop to more evenly distribute the gases prior to passing through the gas distribution plate. A bypass gas pathway delivers a second gas through the plurality of feed through passageways in the blocker plate and to areas around the blocker plate prior to the second gas passing through the gas distribution plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.