Inventor · Sunnyvale, CA, US

Ganesh Balasubramanian

112Patents
8h-index
202Co-inventors
83Inventor score

Filing activity: Sep 1, 2004 → Sep 1, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US9355876B2 Process load lock apparatus, lift assemblies, electronic device processing systems, and methods of processing substrates in load lock locations Emerging Cross-Sectional Technologies 434 Active
US9157730B2 PECVD process Physics 46 Active
US7572337B2 Blocker plate bypass to distribute gases in a chemical vapor deposition system Electricity 28 Active
US8197636B2 Systems for plasma enhanced chemical vapor deposition and bevel edge etching Electricity 22 Active
US7622005B2 Uniformity control for low flow process and chamber to chamber matching Chemistry; Metallurgy 13 Active
US7829145B2 Methods of uniformity control for low flow process and chamber to chamber matching Chemistry; Metallurgy 11 Active
US9458537B2 PECVD process Physics 8 Active
US7166544B2 Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursors Electricity 8 Expired
US10403535B2 Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system Electricity 7 Active
US9816187B2 PECVD process Physics 7 Active
US7259111B2 Interface engineering to improve adhesion between low k stacks Electricity 6 Expired
US9025299B2 Triggered arc flash arrester and shield element for use therewith Electricity 6 Active
US7867578B2 Method for depositing an amorphous carbon film with improved density and step coverage Electricity 6 Active
US9390910B2 Gas flow profile modulated control of overlay in plasma CVD films Electricity 5 Active
US11670492B2 Chamber configurations and processes for particle control Electricity 4 Active
US8778813B2 Confined process volume PECVD chamber Electricity 4 Active
US10276353B2 Dual-channel showerhead for formation of film stacks Electricity 4 Active
US7922440B2 Apparatus and method for centering a substrate in a process chamber Emerging Cross-Sectional Technologies 4 Active
US10600624B2 System and method for substrate processing chambers Electricity 3 Active
US10100408B2 Edge hump reduction faceplate by plasma modulation Electricity 3 Active
US8282734B2 Methods to improve the in-film defectivity of PECVD amorphous carbon films Chemistry; Metallurgy 3 Active
US10580623B2 Plasma processing using multiple radio frequency power feeds for improved uniformity Electricity 3 Active
US7189658B2 Strengthening the interface between dielectric layers and barrier layers with an oxide layer of varying composition profile Emerging Cross-Sectional Technologies 3 Expired
US7699935B2 Method and system for supplying a cleaning gas into a process chamber Emerging Cross-Sectional Technologies 2 Active
US10793954B2 PECVD process Physics 2 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.