System and method for processing an organic memory cell
US7632706B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 21, 2005 |
| Grant date | Dec 15, 2009 |
| Priority date | — |
| Expiry date | Jul 31, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K19/202
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A system and method are disclosed for processing an organic memory cell. An exemplary system can employ an enclosed processing chamber, a passive layer formation component operative to form a passive layer on a first electrode, and an organic semiconductor layer formation component operative to form an organic semiconductor layer on the passive layer. A wafer substrate is not needed to transfer from a passive layer formation system to an organic semiconductor layer formation system. The passive layer is not exposed to air after formation of the passive layer and before formation of the organic semiconductor layer. As a result, conductive impurities caused by the exposure to air do not occur in the thin film layer, thus improving productivity, quality, and reliability of organic memory devices. The system can further employ a second electrode formation component operative to form a second electrode on the organic semiconductor layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.