Patent · US Active

Substrate processing apparatus and method

US7633070B2 · kind B2 · utility

4Cited by
5References
50Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 2, 2007
Grant dateDec 15, 2009
Priority date—
Expiry dateJan 9, 2028

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/317
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A substrate processing apparatus and method are disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.