Noah Bareket
49Patents
16h-index
52Co-inventors
84Inventor score
Filing activity: Jul 6, 1982 → Jun 5, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5889593A | Optical system and method for angle-dependent reflection or transmission measurement | Physics | 256 | Expired |
| US6023338A | Overlay alignment measurement of wafers | Electricity | 207 | Expired |
| US6079256A | Overlay alignment measurement of wafers | Electricity | 144 | Expired |
| US6462818B1 | Overlay alignment mark design | Physics | 117 | Expired |
| US7826071B2 | Parametric profiling using optical spectroscopic systems | Physics | 95 | Active |
| US6614520B1 | Method for inspecting a reticle | Physics | 77 | Expired |
| US7317531B2 | Apparatus and methods for detecting overlay errors using scatterometry | Physics | 49 | Expired |
| US7897942B1 | Dynamic tracking of wafer motion and distortion during lithography | Physics | 44 | Active |
| US7280230B2 | Parametric profiling using optical spectroscopic systems | Physics | 42 | Expired |
| US7280212B2 | Apparatus and methods for detecting overlay errors using scatterometry | Physics | 34 | Expired |
| US7298481B2 | Apparatus and methods for detecting overlay errors using scatterometry | Physics | 34 | Expired |
| US6580505B1 | Overlay alignment mark design | Physics | 33 | Expired |
| US7301634B2 | Apparatus and methods for detecting overlay errors using scatterometry | Physics | 24 | Expired |
| US7716003B1 | Model-based measurement of semiconductor device features with feed forward use of data for dimensionality reduction | Physics | 23 | Active |
| US4480916A | Phase-modulated polarizing interferometer | Physics | 22 | Expired |
| US4583855A | Optical phase measuring apparatus | Physics | 21 | Expired |
| US7483133B2 | Multiple angle of incidence spectroscopic scatterometer system | Physics | 16 | Expired |
| US10603394B2 | UV sterilization of container, room, space or defined environment | Emerging Cross-Sectional Technologies | 15 | Active |
| US7379183B2 | Apparatus and methods for detecting overlay errors using scatterometry | Physics | 14 | Expired |
| US7663753B2 | Apparatus and methods for detecting overlay errors using scatterometry | Physics | 13 | Active |
| US7933016B2 | Apparatus and methods for detecting overlay errors using scatterometry | Physics | 12 | Active |
| US10046073B2 | Portable UV devices, systems and methods of use and manufacturing | Emerging Cross-Sectional Technologies | 10 | Active |
| US7515253B2 | System for measuring a sample with a layer containing a periodic diffracting structure | Physics | 9 | Active |
| US10369053B2 | Corneal topography measurements and fiducial mark incisions in laser surgical procedures | Human Necessities | 8 | Active |
| US10485704B2 | Corneal topography measurement and alignment of corneal surgical procedures | Human Necessities | 7 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.