Patent · US Active

Micromechanical device and method for producing a micromechanical device

US7647832B2 · kind B2 · utility

2Cited by

5References

8Claims

0Family size

Assignee

Robert Bosch GmbH · DE

Inventors

Joerg Muchow · Reutlingen, DE
Hubert Benzel · Neckartenzlingen, DE
Markus Lang · Dresden, DE
Regina Grote · Reutlingen, DE
Simon Armbruster · Wannweil, DE
Gerhard Lammel · Lörrach, DE
Christoph Schelling · Stuttgart, DE
Volkmar Senz · Metzingen, DE

Key dates

Filing date	Nov 15, 2006
Grant date	Jan 19, 2010
Priority date	—
Expiry date	Aug 15, 2027

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB81B2201/0264
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A micromechanical device and a method for producing this device are provided, the device having a sensor pattern that includes a spring pattern and a seismic mass. The seismic mass may be connected to the substrate material via the spring pattern, and a clearance may be provided in a direction perpendicular to the major substrate plane between the spring pattern and the substrate material. Alternatively, the spring pattern and the seismic mass may have a common, essentially continuous, front side surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.