Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers

US7647886B2 · kind B2 · utility

Assignee

• Micron Technology, Inc. · US

Inventors

• David J. Kubista · Nampa, US
• Trung T. Doan · Los Gatos, US
• Lyle Breiner · Meridian, US
• Ronald A. Weimer · Boise, US
• Kevin L. Beaman · Boise, US
• Er-Xuan Ping · Boise, US
• Lingyi A. Zheng · Boise, US
• Cem Basceri · Boise, US

Key dates

• Filing date: Oct 15, 2003
• Grant date: Jan 19, 2010
• Expiry date: Jul 5, 2027

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T137/0396
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers are disclosed herein. In one embodiment, the system includes a gas phase reaction chamber, a first exhaust line coupled to the reaction chamber, first and second traps each in fluid communication with the first exhaust line, and a vacuum pump coupled to the first exhaust line to remove gases from the reaction chamber. The first and second traps are operable independently to individually and/or jointly collect byproducts from the reaction chamber. It is emphasized that this Abstract is provided to comply with the rules requiring an abstract. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.