Erosion-resistant components for plasma process chambers
US7670688B2 · kind B2 · utility
8Cited by
18References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 25, 2001 |
| Grant date | Mar 2, 2010 |
| Priority date | — |
| Expiry date | Mar 27, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/12736
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An erosion-resistant article for use as a component in plasma process chamber. The erosion-resistant article comprises a support and an oxide coating comprising yttrium, which is disposed over the support. The support and the oxide coating preferably have material compositions that differ from one another in coefficient of thermal expansion by no more than 5×10−6/K. Preferred oxide coating compositions include yttria and yttrium aluminum garnet. Preferred supports include alumina supports and aluminum-silicon carbide supports.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.