Patent · US Active

Lithographic apparatus and device manufacturing method

US7684013B2 · kind B2 · utility

6Cited by

11References

15Claims

0Family size

Assignees

ASML NETHERLANDS B.V. · NL
Carl Zeiss SMT GmbH · DE

Inventors

Steven George Hansen · Phoenix, US
Donis Flagello · Rue de l'Église, US
Wolfgang Singer · Aalen, DE
Bernd Geh · Scottsdale, US
Vladan Blahnik · Aalen, DE

Key dates

Filing date	May 18, 2006
Grant date	Mar 23, 2010
Priority date	—
Expiry date	Jun 22, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7025
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A lithographic apparatus includes an illumination unit including a radiation source configured to generate a radiation bundle, an illumination optics with a numerical aperture NA0 and an aperture system; a projection lens having a first numerical aperture NAOB1; a support arranged between the illumination unit and the projection lens and configured to support a patterning device; a substrate support configured to support a substrate on which structures on the patterning device are imaged, wherein the first numerical aperture NAOB1 of the projection lens is smaller than the numerical aperture NA0 of the illumination unit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.