Imaging system for a microlithographical projection light system

US7719658B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Andreas Dorsel · Menlo Park, US
• Toralf Gruner · Hennef (Sieg), DE
• Bernhard Kneer · Riedlingen, DE
• Susanne Beder · Aalen, DE
• Alexander Epple · Aalen, DE
• Norbert Wabra · Werneck, DE

Key dates

• Filing date: Jan 13, 2005
• Grant date: May 18, 2010
• Expiry date: Oct 5, 2026

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70966
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Imaging system of a microlithographic projection exposure apparatus, with a projection objective (200, 300, 500, 600) that serves to project an image of a mask which can be set into position in an object plane onto a light-sensitive coating layer which can be set into position in an image plane, and with a liquid-delivery device (205) serving to fill immersion liquid (202, 310, 507) into an interstitial space between the image plane and a last optical element (201, 309, 506) on the image-plane side of the projection objective; wherein the last optical element on the image-plane side of the projection objective is arranged so that, seen in the direction of gravity, it follows the image plane; and wherein the projection objective is configured in such a way that when the system is operating with immersion, the immersion liquid has at least in some areas a convex-curved surface facing in the direction away from the image plane. It is also proposed for the last optical element (201, 309, 506) on the image-plane side of the projection objective to be arranged below the image plane in such a way that the immersion liquid (202, 310, 507, 601) is held at least in part in a substantially tu…