Excimer laser inspection system
US7728968B2 · kind B2 · utility
6Cited by
59References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 8, 2006 |
| Grant date | Jun 1, 2010 |
| Priority date | — |
| Expiry date | Nov 8, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/06113
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and method for inspecting a specimen, such as a semiconductor wafer, including illuminating at least a portion of the specimen using an excimer source using at least one relatively intense wavelength from the source, detecting radiation received from the illuminated portion of the specimen, analyzing the detected radiation for potential defects present in the specimen portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.