Magnetron having continuously variable radial position
US7736473B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2005 |
| Grant date | Jun 15, 2010 |
| Priority date | — |
| Expiry date | Nov 19, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3408
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A continuously variable multi-position magnetron that is rotated about a central axis in back of a sputtering target at a freely selected radius. The position is dynamically controlled from the outside, for example, through a hydraulic actuator connected between a pivoting arm supporting the magnetron and an arm fixed to the shaft, by two coaxial shafts independent controllable from the outside and supporting the magnetron through a frog-leg mechanism, or a cable connected between the pivoting arms and moved by an external slider. The magnetron can be rotated at two, three, or more discrete radii or be moved in a continuous spiral pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.